Evidence map›Paper›PMID 37447979›Full record

ArticleSensors (Basel, Switzerland)2023

Multielectrode Arrays at Wafer-Level for Miniaturized Sensors Applications: Electrochemical Growth of Ag/AgCl Reference Electrodes.

Haosheng Wu, Robert Krause, Eshanee Gogoi, André Reck, Alexander Graf, Marcus Wislicenus, Olaf R Hild, Conrad Guhl

Abstract read
In one paragraph

Article in Sensors (Basel, Switzerland), 2023. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 4 papers.

0numbers the graph read from it
0cells of the map it votes in
4citing papers in PubMed
–field-weighted citation impact
1 · What the graph read from it

What it found

Each row is one number read from the abstract, on the scale the paper reported it, with its interval. Left of the dashed line favours the treatment, right favours the comparator. Under each row is the sentence it came from. New to these charts? A ten-minute tutorial.

The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.

2 · The registry

The trial behind it

Trials whose registry record cites this paper, or whose number appears in the abstract. A trial that started after this paper was published is citing it as background, not reporting it.

Neither the registry nor the abstract names a trial number. If this is a trial report, that itself is worth knowing.

3 · Its place in the literature

Who cites it

4 citing papers in PubMed.

  1. Article
  2. Article
  3. Review
  4. Article
4 · The record

Corrections and comments

PubMed lists nothing against this paper. Absence here is not a guarantee, only a check that was made.

5 · Who and what money

Authors and funding

8 authors.

Haosheng WuFraunhofer Institute for Photonic Microsystems (IPMS), Center Nanoelectronic Technologies (CNT), An der Bartlake 5, 01109 Dresden, Germany.ORCID 0000-0001-6979-2243
Robert KrauseFraunhofer Institute for Photonic Microsystems (IPMS), Center Nanoelectronic Technologies (CNT), An der Bartlake 5, 01109 Dresden, Germany.ORCID 0009-0004-9173-4655
Eshanee GogoiFraunhofer Institute for Photonic Microsystems (IPMS), Center Nanoelectronic Technologies (CNT), An der Bartlake 5, 01109 Dresden, Germany.
André ReckFraunhofer Institute for Photonic Microsystems (IPMS), Center Nanoelectronic Technologies (CNT), An der Bartlake 5, 01109 Dresden, Germany.ORCID 0000-0002-3712-8652
Alexander GrafFraunhofer Institute for Photonic Microsystems (IPMS), Maria-Reiche-Str. 2, 01109 Dresden, Germany.
Marcus WislicenusFraunhofer Institute for Photonic Microsystems (IPMS), Center Nanoelectronic Technologies (CNT), An der Bartlake 5, 01109 Dresden, Germany.
Olaf R HildFraunhofer Institute for Photonic Microsystems (IPMS), Maria-Reiche-Str. 2, 01109 Dresden, Germany.
Conrad GuhlFraunhofer Institute for Photonic Microsystems (IPMS), Center Nanoelectronic Technologies (CNT), An der Bartlake 5, 01109 Dresden, Germany.

Funding

Development Bank of Saxony 3784
6 · The paper itself

Abstract

In this study, a range of miniaturized Ag/AgCl reference electrodes with various layouts were successfully fabricated on wafer-level silicon-based substrates with metallic intermediate layers by precisely controlling the electrochemical deposition of Ag, followed by electrochemical chlorination of the deposited Ag layer. The structure, as well as the chemical composition of the electrode, were characterized with SEM & EDS. The results showed that the chlorination is very sensitive to the applied electric field and background solution. Potentiostatic chlorination, in combination with an adjusted mushroom-shaped Ag sealing deposition, enabled the formation of electrochemical usable Ag/AgCl layers. The stability of the electrodes was tested using open circuit potential (OCP) measurement. The results showed that the reference electrodes stayed stable for 300 s under 3 M KCl solution. The first stage study showed that the stability of the Ag/AgCl reference electrode in a chip highly depends on chip size design, chlorination conditions, and a further protection layer.

Indexed as

SilverSilver CompoundsElectrodesMicroelectrodesSilverSilver Compoundschlorinationreference electrodessilver/silver chlorideunderlying metal layers

Identifiers

PMID37447979
PMCPMC10347207

What Socratic holds

Textmetadata
LicenceCC BY
Read underepoch 390

Registered trials

None linked

Read under generation 80e0d062 · epoch 390. Bibliography from PubMed, PubMed Central and OpenAlex; grants from NIH RePORTER; trial links from ClinicalTrials.gov; estimates, votes and beliefs from the Socratic graph.