ArticleSmall (Weinheim an der Bergstrasse, Germany)2025
Nanoscale Silicon Fingerprints for Counterfeit Prevention in Microchips.
Article in Small (Weinheim an der Bergstrasse, Germany), 2025. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 2 papers.
What it found
Each row is one number read from the abstract, on the scale the paper reported it, with its interval. Left of the dashed line favours the treatment, right favours the comparator. Under each row is the sentence it came from. New to these charts? A ten-minute tutorial.
The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.
The trial behind it
Trials whose registry record cites this paper, or whose number appears in the abstract. A trial that started after this paper was published is citing it as background, not reporting it.
Neither the registry nor the abstract names a trial number. If this is a trial report, that itself is worth knowing.
Who cites it
2 citing papers in PubMed.
- Interlayer-Catalyst Method for Metal-Assisted Chemical Etching of Ultra-High Aspect Ratio Silicon Nanostructures.Small methods · 2026Article
- Nanoscale Silicon Fingerprints for Counterfeit Prevention in Microchips.Small (Weinheim an der Bergstrasse, Germany) · 2025Article
Corrections and comments
PubMed lists nothing against this paper. Absence here is not a guarantee, only a check that was made.
Authors and funding
7 authors.
Funding
Abstract
The increasing vulnerability of microchips to counterfeiting poses a significant threat to nations, companies, and the general public. Creating a unique "fingerprint" on each chip using intrinsic manufacturing variations can significantly prevent the number of fraudulent chips. Since Si-based semiconductor fabrication processes are now flawless down to a few nanometers, finding a high-entropy source at the nanoscale has become challenging. Inspired by the concept of physical unclonable function, this work reports the CMOS-compatible and lithography-free fabrication of unique nanostructured silicon "fingerprints." Nanostructuring is achieved via low-temperature dewetting and metal-assisted chemical etching, which produces a high level of entropy and unique silicon-based nanoscale fingerprints with linewidths tunable from ≈8 to 140 nm, commensurate with the dimensions of mainstream microfabrication processes. These Si nanofingerprints are highly reliable for chip authentication and against reverse engineering, providing a large encoding capacity of up to 2
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Registered trials
Read under generation 80e0d062 · epoch 390. Bibliography from PubMed, PubMed Central and OpenAlex; grants from NIH RePORTER; trial links from ClinicalTrials.gov; estimates, votes and beliefs from the Socratic graph.