Comprehensive Investigation of the Commercial ELP-20 Electron-Beam Lithography Resist.

Meruert Qairat, Aliya Alzhanova, Mustakhim Pshikov, Renata Nemkayeva, Nazim Guseinov, Sergey Zaitsev, Mukhit Muratov

Abstract read

In one paragraph

Article in Micromachines, 2025. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Not yet cited in PubMed.

0numbers the graph read from it

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0citing papers in PubMed

–field-weighted citation impact

1 · What the graph read from it

What it found

Each row is one number read from the abstract, on the scale the paper reported it, with its interval. Left of the dashed line favours the treatment, right favours the comparator. Under each row is the sentence it came from. New to these charts? A ten-minute tutorial.

The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.

2 · The registry

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Neither the registry nor the abstract names a trial number. If this is a trial report, that itself is worth knowing.

3 · Its place in the literature

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0 citing papers in PubMed.

No citing paper in PubMed yet.

4 · The record

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5 · Who and what money

Authors and funding

7 authors.

Meruert QairatNational Nanotechnological Laboratory of Open Type, Al-Farabi Kazakh National University, Almaty 050040, Kazakhstan.

Aliya AlzhanovaNational Nanotechnological Laboratory of Open Type, Al-Farabi Kazakh National University, Almaty 050040, Kazakhstan.ORCID 0000-0002-0511-1477

Mustakhim PshikovNational Nanotechnological Laboratory of Open Type, Al-Farabi Kazakh National University, Almaty 050040, Kazakhstan.

Renata NemkayevaNational Nanotechnological Laboratory of Open Type, Al-Farabi Kazakh National University, Almaty 050040, Kazakhstan.ORCID 0000-0002-8782-703X

Nazim GuseinovNational Nanotechnological Laboratory of Open Type, Al-Farabi Kazakh National University, Almaty 050040, Kazakhstan.ORCID 0000-0002-4712-3273

Sergey ZaitsevInstitute of Microelectronics Technology and High Purity Materials, Russian Academy of Sciences, Chernogolovka, 142432 Moscow, Russia.ORCID 0000-0001-5120-8651

Mukhit MuratovNational Nanotechnological Laboratory of Open Type, Al-Farabi Kazakh National University, Almaty 050040, Kazakhstan.ORCID 0000-0001-7270-9834

Funding

This research was financially supported by the Committee of Science of the Ministry of Science and Higher Education of the Republic of Kazakhstan Grant No. AP19576960

6 · The paper itself

Abstract

A systematic experimental study of the positive-tone resist ELP-20 was conducted, covering its structural properties, film-formation behavior, and response to electron-beam exposure. Raman spectroscopy demonstrated the methacrylate nature of the resist and its spectral correspondence to poly(methyl methacrylate) PMMA, which enabled direct comparison both with PMMA itself and with existing methacrylate-based resists. Spin-coated films prepared from 3-11 wt.% solutions exhibited a robust power-law dependence of thickness on spin speed, h

Indexed as

contrastelectron-beam lithography (EBL)ELP-20 resistsensitivityspin coating

Identifiers

PMID41597785

DOI10.3390/mi17010004

PMCPMC12844123

What Socratic holds

Textmetadata

LicenceCC BY

Read underepoch 390

Registered trials

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Read under generation 80e0d062 · epoch 390. Bibliography from PubMed, PubMed Central and OpenAlex; grants from NIH RePORTER; trial links from ClinicalTrials.gov; estimates, votes and beliefs from the Socratic graph.