A Review on the Research Progress of Imprint Film Materials for Nanoimprint Lithography.

Nanoimprint lithography (NIL) is highly dependent on imprinted film as a pattern-transfer medium. This paper systematically reviews the research progress of imprint film materials for NIL. Firstly, polydimethylsiloxane (PDMS), polyethylene terephthalate (PET), polyvinyl alcohol (PVA) and other single-polymer films are discussed, and their respective advantages (such as low surface energy, high optical transparency, water solubility) and inherent limitations (elastic deformation, demolding difficulties, humidity sensitivity)) are summarized. In order to overcome the above contradiction, researchers developed a composite imprint film structure, including an elastomer-rigid bilayer template and sandwich structure film, which achieved high resolution, conformal contact and facile demolding characteristics through mechanical function decoupling. At the same time, the emerging polymer/transparent electrode composite system (such as AgNWs/PVA, AgNWs/PDMS) gives the film active functions such as self-heating and antistatic ones, which effectively solves the key challenges in thermal management and electrostatic control. This paper comprehensively presents the evolution path from single-material to multi-functional composites, and provides guidance for the design of advanced imprint film for high precision, high reliability and large-scale NIL applications.