ArticleNature communications2026
Single-exposure holographic lithography of ultra-high aspect-ratio microstructures.
Article in Nature communications, 2026. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Not yet cited in PubMed.
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The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.
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Authors and funding
3 authors.
Funding
Abstract
Three-dimensional microfabrication is essential for microfluidics, micromechanical devices, optical components and architected materials, but current methods often trade resolution for speed: layer-by-layer and point-scanning approaches are slow, whereas fast volumetric printing lacks fine features. Here we show a single-exposure holographic lithography method that prints tall, high-resolution polymer microstructures in about 20 s. An inverse-designed phase mask-an optical element computed to shape light in three dimensions-projects a stable intensity pattern through thick photoresist, overcoming the blurring that normally limits deep photolithography. The method produces lattices, Penrose patterns and micromechanical structures with features as small as 6 µm across volumes up to 800 × 800 × 720 µm
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Registered trials
Read under generation 80e0d062 · epoch 390. Bibliography from PubMed, PubMed Central and OpenAlex; grants from NIH RePORTER; trial links from ClinicalTrials.gov; estimates, votes and beliefs from the Socratic graph.